Impedance Matching Networks are required to: 

• prevent the reflection of the power transmitted by the generator,

• protect the RF generator,

• maximize the power input to the load,

• make the processes repeatable,

• and provide the necessary field intensity in the enclosure before and after the formation of plasma. 

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AMN0XUIS Works at three independent modes of operation:

• Automatic mode

• Manual mode

• Preset mode

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Adjustable Parameters:

• Various parameters can be adjusted and their performance can be observed through the front panel of the controller or remotely.

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Fast Performance:

• Approximately 2 seconds is needed to form the plasma and perform complete matching for standard loads.

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Wide range of impedance matching:

• 1 to 45 ohm and -200j to +30j.

• Custom design impedance matching range is possible.

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Applications:

• Semiconductor production.

• Physical and chemical plasma deposition.

• Plasma etching.

• Various plasma processing techniques.

• Heating and melting discarded dielectrics.